Technical features

• The large-format iGrapher is a large direct writing lithography system specially designed for rapid and high-quality patterning on large-size substrates (with a meter-scale area). The iGrapher 1000-3000 series covers lithography areas ranging from 32 inches to 130 inches, meeting the large-area patterning needs for touch control, display, lighting, and more.
• The iGrapher series is equipped with a 355 nm solid-state laser as the light source and a writing optical system with high numerical aperture to support the processes for near ultraviolet photosensitive materials. It has an air-bearing motion system, an interferometer closed-loop system, and an environmental control system, provides excellent capabilities to control the linewidth precision and uniformity, and supports 24/7 continuous operation.
• It supports common industrial data formats such as GDSII and DXF to meet conventional lithography requirements. It is equipped with a data processing server to support high-resolution, real-time, and high-throughput processing of 3D structure data formats such as STL, as well as real-time pattern transforming of the analytically expressed designs. It is an effective equipment for innovation and development of micro/nano optical materials and optical films.

Specifications

* The metrics may vary depending on the processes

Example applications